Current status of development of ion sources in Japan from a standpoint of materials science (invited)
作者： Toshinori Takagi , Junzo Ishikawa
DOI: 10.1063/1.1141239
关键词: Focused ion beam 、 Atomic physics 、 Secondary ion mass spectrometry 、 Ion gun 、 Ion source 、 Materials science 、 Ion beam 、 Engineering physics 、 Ion beam deposition 、 Ion 、 Ion implantation
摘要: The current status of development novel ion sources for materials science in Japan is reviewed. Several types microwave which permit a reactive gas discharge have been developed the production high intensity and low‐charge‐state beams. plasma cathode technique, as an electron source, provides conventional with long lifetime. Metal can deliver pure metal beam developed, extracting ions from temperature chamber large volume or porous tip surface. A new principle source by use cluster, consists hundreds to thousands atoms, has developed. High negative both light heavy ions, resulting in‐depth investigation mechanisms.
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