Spectroscopic ellipsometry studies on microstructure evolution of a-Si:H to nc-Si:H films by H2 plasma exposure
作者： Venkanna Kanneboina , Ramakrishna Madaka , Pratima Agarwal
DOI: 10.1016/J.MTCOMM.2018.02.023
关键词: Etching (microfabrication) 、 Plasma-enhanced chemical vapor deposition 、 Silicon 、 Absorption spectroscopy 、 Silane 、 Amorphous silicon 、 Analytical chemistry 、 Materials science 、 Nanocrystalline material 、 Raman spectroscopy
摘要: … The evolution of nanocrystalline Si phase due to intermittent hydrogen plasma treatment is studied through Spectroscopic Ellipsometry(SE), Raman and FTIR absorption spectroscopy. …
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