Effects of cluster incorporation into hydrogenated amorphous silicon films in initial discharge phase on film stability

作者: Susumu Toko , Yoshihiro Torigoe , Weiting Chen , Daisuke Yamashita , Hyunwoong Seo

DOI: 10.1016/J.TSF.2015.02.052

关键词:

摘要: Abstract We studied the effects of incorporation hydrogenated amorphous silicon (a-Si:H) nanoparticles (clusters) generated in initial discharge phase on light induced degradation a-Si:H films. The amount clusters incorporated into films is 15 times larger than that steady state. To evaluate such cluster stability films, we fabricated Schottky cells with and without using a multi-hollow plasma chemical vapor deposition method shutter compared cell against exposure. ratio less 1% even after 100 hour soaking 2.7 suns. Our results show suppressing key to stable cells. Moreover, Si–H 2 bonds can be reduced down 1/10 eliminating filter.

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