Deposition apparatus and method for operating the same
作者： Kawakami Satoru
DOI:
关键词: Materials science 、 Head (vessel) 、 Deposition (phase transition) 、 Piping 、 Forming processes 、 Metallurgy 、 Gas supply 、 Chemical vapor deposition
摘要: [PROBLEMS] To remove materials deposited on an inner surface and the like of a processing chamber vapor deposition apparatus without opening chamber. [MEANS FOR SOLVING PROBLEMS] A (13) is provided for performing film forming process to subject (G) be processed by deposition. The with head (65) supplying material; generating sections (70-72) vaporizing cleaning gas section (86) gas; supply piping (81-83) material from (70-72); (87) (86). are on-off valves (75-78).
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