A NEXAFS characterization of ion-beam-assisted carbon-sputtered thin films
作者： M. Jaouen , G. Tourillon , J. Delafond , N. Junqua , G. Hug
DOI: 10.1016/0925-9635(94)00252-5
关键词: Extended X-ray absorption fine structure 、 Amorphous carbon 、 Amorphous solid 、 Ion beam 、 Carbon 、 Sputtering 、 Analytical chemistry 、 Carbon film 、 Materials science 、 Thin film
摘要: Abstract Thin carbon films were deposited by sputtering with various species means of the technique dynamic ion mixing (DIM). Transmission electron microscopy experiments reveal that are amorphous and contain contaminants, mainly oxygen. Density values determined glancing X-ray reflectometry. Friction wear resistance measurements have been accomplished. Near-edge absorption fine structure (NEXAFS) performed at both CK OK edges. The edge NEXAFS data for a film obtained DIM an argon-methane mixture filling source show strong peak is attributed to CH OCOH bonds, while number sp 2 -hybridized sites quite small. More damped features observed without when argon-hydrogen used. However, then greater. When used, we observe in spectrum high energy irradiation induces hydrogen release. A correlation behaviour suggested.
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