Enhanced formation of Ge nanocrystals in Ge : SiO 2 layers by swift heavy ions

作者: I V Antonova , V A Skuratov , V A Volodin , S A Smagulova , D M Marin

DOI: 10.1088/0022-3727/45/28/285302

关键词: Analytical chemistryAmorphous solidPhotoluminescenceRaman spectroscopyAnnealing (metallurgy)IrradiationIonNanocrystalMaterials scienceMineralogyFluence

摘要: In this paper we report the ability of swift heavy Xe ions with an energy 480MeV and a fluence 10 12 cm −2 to enhance formation Ge nanocrystals within SiO2 layers variable contents. These Ge-SiO2 films were fabricated by co-sputtering quartz sources which followed various annealing procedures. particular, found that irradiation Ge:SiO2 subsequent at 500 ◦ C leads high concentration (NCs) size 2‐5nm, whereas without only amorphous inclusions observed. This effect, as evidenced Raman spectra, is enhanced pre-irradiation 550 post-irradiation 600 C, also observation room temperature visible photoluminescence. (Some figures may appear in colour online journal)

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