Micromachining of pulsed laser annealed PECVD SixGe1-x deposited at temperatures <= 370 degrees C
作者： S Sedky , Ann Witvrouw
DOI:
关键词: Optoelectronics 、 Polycrystalline silicon 、 Pulsed laser deposition 、 Surface micromachining 、 Analytical chemistry 、 Plasma-enhanced chemical vapor deposition 、 Materials science 、 Pulsed laser 、 Crystallization
摘要:
kuleuven.be 参考文章(9)
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