作者: Ching-Yuan Wu
DOI:
关键词: Layer (electronics) 、 Optoelectronics 、 Bit line 、 Scalability 、 Dielectric 、 Bit (horse) 、 Electrical engineering 、 Materials science 、 Electrical conductor 、 Flash memory
摘要: A scalable dual-bit flash memory cell of the present invention comprises a gate region having pair floating-gate structures with select-gate being formed therebetween and planarized control/select-gate over second gate-dielectric layer or without sidewall dielectric spacers floating gates; conductive bit line together first spacer flat bed by source/drain diffusion etched raised field-oxide layers. contactless array plurality bit-lines transversely to parallel STI regions word lines integrated control-gate/select-gates described cells patterned bit-lines.