Comparative study of the radio-frequency magnetron sputter deposited CaP films fabricated onto acid-etched or pulsed electron beam-treated titanium

作者: M.A. Surmeneva , R.A. Surmenev , A.I. Tyurin , T.M. Mukhametkaliyev , A.D. Teresov

DOI: 10.1016/J.TSF.2014.10.049

关键词: MetallurgyMaterials scienceTitaniumComposite materialSubstrate (electronics)SputteringCoatingSputter depositionScanning electron microscopeNanoindentationX-ray photoelectron spectroscopy

摘要: Abstract This study investigated the effect of substrate morphology introduced by various preparation techniques, namely acid etching (AE) and pulsed electron beam (PEB) treatments, on CaP film mechanical properties. The morphology, nanohardness, Young's modulus coating deposited via radio-frequency (RF) magnetron sputtering were X-ray photoelectron spectroscopy (XPS), atomic force microscope (AFM), scanning microscopy nanoindentation studies. Ca/P ratios RF onto titanium substrates treated using AE PEB according to XPS 1.73 ± 0.03 1.72 ± 0.04, respectively, which is close ratio 1.67 typical for stoichiometric hydroxyapatite (HA). AFM experiments studies revealed significant differences in responses films acid-etched with PEB. Deposition surface resulted a rough presence an island-like morphology. smooth exhibited grains irregular shapes decreased size. hardness HA treatment determined be 7.0 ± 0.3 124 ± 3 GPa, are significantly higher than those substrates. Moreover, elastic strain failure (H/E), plastic deformation resistance (H3/E2), percent recovery %R after irradiation energy density 15 J·cm− 2 increase ~ 23%, ~ 70% ~ 53%, compared titanium.

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