作者: Vladimir Knyazik , Kyle Tantiwong , Samer Banna
DOI:
关键词: Plasma processing 、 Acoustics 、 Diffuser (thermodynamics) 、 Base (geometry) 、 Edge (geometry) 、 Wafer 、 Plasma etching 、 Uniform distribution (continuous) 、 Azimuth 、 Mechanical engineering 、 Materials science
摘要: An electrostatic chuck (ESC) with a cooling base for plasma processing chambers, such as etch chamber. In embodiments, includes plurality of independent edge zones. the zones are segments spanning different azimuth angles to permit temperature tuning, which may be used compensate other chamber related non-uniformities or incoming wafer non-uniformities. center zone having first heat transfer fluid supply and control loop, zones, together covering remainder area, each separate loops. diffuser, have hundreds small holes over area provide uniform distribution fluid.