Plasma processing apparatus and component thereof including an optical fiber for determining a temperature thereof

摘要: A plasma processing apparatus for semiconductor substrates comprises a chamber in which substrate is processed. process gas source fluid communication with the and adapted to supply into chamber. RF energy energize state Process byproducts of are exhausted from through vacuum port. At least one component laterally extending optical fiber beneath exposed surface wherein spatial temperature measurements desired be taken, monitoring arrangement coupled so as monitor temperatures at different locations along fiber.