Mismatch Characterization of Submicron MOS Transistors

作者: J. Bastos , M. Steyaert , A. Pergoot , W. Sansen

DOI: 10.1023/A:1008256724276

关键词: PMOS logicThreshold voltageTransistorInverseCMOSSquare rootOptoelectronicsNMOS logicElectronic engineeringMaterials scienceCommunication channel

摘要: The characterization of transistor mismatch in a standard 0.7 µm CMOS technology is presented. A new method for matching parameter extraction has been used. Mismatch parameters based on measurements 10000 nMOS and pMOS transistors have extracted. It observed that the threshold voltage linear dependency inverse square root effective channel area no longer holds length. An extended model physical causes proposed. Contrary to established theory, it with length below 1 less current than what predicted by relationship area.

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