A bibliography of metal-insulator-semiconductor studies
作者： E.S. Schlegel
关键词: Electrical engineering 、 Fabrication 、 Materials science 、 Bibliography 、 Insulator (electricity) 、 Hybrid silicon laser 、 Transistor 、 Silicon nitride 、 Semiconductor 、 Silicon 、 Engineering physics
摘要: A bibliography of more than 550 papers in the field metal-insulator-semiconductor theory and technology provides a catalog published work so that investigators can easily relate their to reported by others. In most papers, insulator layer discussed is SiO 2 or silicon nitride, semiconductor silicon. The information has been arranged according following major classifications: MOS transistor behavior physics preparation oxide layers techniques for evaluating related from glass device fabrication radiation effects alternative materials.
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sci-hub.se 参考文章(355)
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E. Kooi, Effects of Low-Temperature Heat Treatments on the Surface Properties of Oxidized Silicon The Surface Properties of Oxidized Silicon. pp. 64- 80 ,(1967) , 10.1007/978-3-662-40210-8_4
E. Kooi, The Surface Charge in Oxidized Silicon The Surface Properties of Oxidized Silicon. pp. 114- 132 ,(1967) , 10.1007/978-3-662-40210-8_7
K.H. Zaininger, A.G. Holmes-Siedle, SURVEY OF RADIATION EFFECTS IN METAL--INSULATOR--SEMICONDUCTOR DEVICES. RCA Rev., 28: 208-40(June 1967).. ,(1967)
D. R. Secrist, J. D. Mackenzie, Microwave discharge deposition of oxide films at low temperatures. ,(1966)
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P.O. Lauritzen, L.D. Philipp, RADIATION INDUCED CHARGE MIGRATION IN MOS-FET TRANSISTORS. ,(1967)
Yoshio Nishi, Electron Spin Resonance in SiO2Grown on Silicon Japanese Journal of Applied Physics. ,vol. 5, pp. 333- 333 ,(1966) , 10.1143/JJAP.5.333
E. Kooi, M. V. Whelan, ON THE ROLE OF SODIUM AND HYDROGEN IN THE Si–SiO2 SYSTEM Applied Physics Letters. ,vol. 9, pp. 314- 317 ,(1966) , 10.1063/1.1754765