Method for cleaning glass substrate
作者： Kazuishi Mitani , Yasuhiro Saito
DOI:
关键词: Polishing 、 Materials science 、 Aqueous solution 、 Nitric acid 、 Chemical engineering 、 Substrate (printing) 、 Metallurgy 、 Abrasive 、 Reducing agent
摘要: After a polishing process of glass substrate with an abrasive containing lanthanoid oxides, the is subjected to first and second washing processes. In process, polished washed solution acid reducing agent, wherein includes at least nitric acid. treated aqueous alkaline detergent. The suitable for recording medium.
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