Processing compositions and methods of using same
作者： Brian A. Vaartstra
DOI:
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摘要: Compositions and methods for processing (e.g., cleaning) substrates, such as semiconductor-based well equipment, include one or more compounds of Formula (I): wherein each R1, R2, R3, R4 is independently H an organic group.
google.de 参考文章(9)
A Brandstrom, B Lamm, K Gustavii, U Junggren, Crystalline hydrogensulfates of quaternary ammonium compounds and their use ,(1970)
Wayne A. Cady, Vlsi chemical reactor ,(1985)
Yutaka C O Nippon Che Yokoyama, Fumihiko C O Nippon Shinozaki, Electrolyte for electrolytic capacitor ,(1987)
Pirmin C. Hidber, Thomas J. Graule, Ludwig J. Gauckler, Citric Acid—A Dispersant for Aqueous Alumina Suspensions Journal of the American Ceramic Society. ,vol. 79, pp. 1857- 1867 ,(1996) , 10.1111/J.1151-2916.1996.TB08006.X
W. A. Cady, M. Varadarajan, RCA Clean Replacement Journal of The Electrochemical Society. ,vol. 143, pp. 2064- 2067 ,(1996) , 10.1149/1.1836950
Hideo Akiya, Shuji Kuwano, Tohru Matsumoto, Hisashi Muraoka, Manabu Itsumi, Norikuni Yabumoto, Thin‐Oxide Dielectric Strength Improvement by Adding a Phosphonic Acid Chelating Agent into NH 4 OH ‐ H 2 O 2 Solution Journal of The Electrochemical Society. ,vol. 141, ,(1994) , 10.1149/1.2059260
Harada Masashi, Tsuriga Kouji, SURFACE TREATING AGENT FOR INORGANIC MATERIAL ,(1984)