作者: George N. Steinberg
DOI:
关键词: Volumetric flow rate 、 Analytical chemistry 、 Wafer 、 Inert 、 Composite material 、 Chemistry 、 Macor 、 Electrode 、 Electric discharge in gases 、 Chimney 、 Insulator (electricity)
摘要: Gas discharge apparatus (10) comprising an annular gas-emitting electrode (11) for use with wafer etching systems, and the like. The gas comprises a housing (12) having provisions cooling predetermined outer inner diameters secured to housing. An inert chimney (13) is disposed against face of adjacent its diameter (14) diameter. chimneys (13, 14) confine from face. insulator (15) that has opening (16) permits flow therethrough produce radially symmetric pattern. within centered relative (11). nonconducting components are typically made materials such as macor, magnesium oxide, fluoride, example. may be aluminum so it can water cooled, example, remove heat during etching, or directly cooled. introduces at center without causing any secondary discharge. Consequently, sufficiently high etch rates achieved. does not exhibit erosion effects very power rates. provides removal profile relatively spatial frequency which finer scale correction surfaces.