Chemical and structural investigation of zinc-oxo cluster photoresists for DUV lithography
作者： Chun-Cheng Yeh , Hung-Chuan Liu , Wajdi Heni , Dominique Berling , Hsiao-Wen Zan
DOI: 10.1039/C6TC05201K
关键词: Electron-beam lithography 、 Nanostructure 、 Optoelectronics 、 Materials science 、 Photolithography 、 Oxide 、 Lithography 、 X-ray lithography 、 Photoresist 、 Nanotechnology 、 Ultraviolet
摘要: Metal oxo cluster photoresists have drawn a lot of attention in recent years due to their interesting properties combining the advantages both inorganic and organic features. Their functionalities offer possibility patterning them by photon or electron beam lithography into metal oxide micro nanostructures. Thanks frameworks, these patterns show higher etch resistance refractive index visible light range than neat patterns. Moreover, nanosize photoresist building blocks makes suitable for high resolution lithography. To an in-depth understanding effect physicochemical parameters on size, shape physical photo-patterned structures, detailed investigation was carried out zinc-oxo combined with deep ultraviolet (DUV) The results impact DUV irradiation thermal treatment material patterning. crystallization is particularly discussed since it has strong influence
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