X-ray photoelectron spectroscopy investigation of commercial passivated tinplate surface layer
作者： Sheng Chen , Long Xie , Fei Xue
DOI: 10.1016/J.APSUSC.2013.03.115
关键词: Layer (electronics) 、 Factor method 、 Sputtering 、 Chemical state 、 X-ray photoelectron spectroscopy 、 Surface layer 、 Metal 、 Peak fitting 、 Chemistry 、 Analytical chemistry
摘要: Abstract X-ray photoelectron spectroscopy (XPS) combined with the low energy Ar + sputtering technique has been used to investigate chemical compositions and states of elements at different depths commercial passivated tinplate surface layer. It is found that Cr 2 O 3 , SnO, Cr(OH) metallic Sn a small amount have mixed in this According peak fitting relative sensitivity factor method, concentrations various environments on depth planes layer obtained.
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