Synthesis, characterization of silicon(IV) compounds containing 2-alkyl-aminopyridine ligands and evaluation of them as CVD precursors

作者: Liyong Du , Wenxiang Chu , Chongying Xu , Hongyan Miao , Yuqiang Ding

DOI: 10.1039/C5RA07045G

关键词: Proton NMRCarbon-13 NMRTrimethylsilylLithiumSiliconAlkylChemical vapor depositionChemistryThermal stabilityInorganic chemistry

摘要: A family of silicon(IV) compounds, where the Si centers trimethylsilyl (–SiMe3) are linked with 2-alkyl-aminopyridine ligands, has been synthesized by reaction corresponding lithium salt these ligands and SiMe3Cl in a general procedure. They were characterized 1H NMR, 13C 29Si EI-MS elemental analysis necessary. Thereinto, NMR synthesis 2-N,N-bis(trimethylsilyl)aminopyridine achieved for confirmation their coordination structures. Significantly, evaluation silicon compounds containing 2-aminopyridinates as CVD precursors was discussed first time. Thermal stability, transport behavior vapour pressures assessed simultaneous thermal analyses (STA). Chemical vapor deposition accomplished hot wall reactor system to qualitatively demonstrate ability them precursors.

参考文章(58)
Muthu B. J. Wijesundara, Gianluca Valente, William R. Ashurst, Roger T. Howe, Albert P. Pisano, Carlo Carraro, Roya Maboudian, Single-Source Chemical Vapor Deposition of 3 C ­ SiC Films in a LPCVD Reactor I. Growth, Structure, and Chemical Characterization Journal of The Electrochemical Society. ,vol. 151, ,(2004) , 10.1149/1.1646141
Hagen Klemm, Silicon Nitride for High-Temperature Applications Journal of the American Ceramic Society. ,vol. 93, pp. 1501- 1522 ,(2010) , 10.1111/J.1551-2916.2010.03839.X
S.F. Wright, D. Dollimore, J.G. Dunn, K. Alexander, Determination of the vapor pressure curves of adipic acid and triethanolamine using thermogravimetric analysis Thermochimica Acta. ,vol. 421, pp. 25- 30 ,(2004) , 10.1016/J.TCA.2004.02.021
Irina Giebelhaus, Ralf Müller, Wieland Tyrra, Ingo Pantenburg, Thomas Fischer, Sanjay Mathur, First air stable tin(II) β-heteroarylalkenolate: Synthesis, characterization and application in chemical vapor deposition Inorganica Chimica Acta. ,vol. 372, pp. 340- 346 ,(2011) , 10.1016/J.ICA.2011.02.052
Cameron Jones, Peter C. Junk, Stuart G. Leary, Neil A. Smithies, Synthesis and structural characterisation of some highly hindered N-functionalised organoamido complexes of titanium(IV) and zirconium(IV) Inorganic Chemistry Communications. ,vol. 6, pp. 1126- 1128 ,(2003) , 10.1016/S1387-7003(03)00208-9
Chang Young Kim, Seung Hyun Kim, R. Navamathavan, Chi Kyu Choi, Won Young Jeung, Characteristics of low-k SiOC(–H) films deposited at various substrate temperature by PECVD using DMDMS/O2 precursor Thin Solid Films. ,vol. 516, pp. 340- 344 ,(2007) , 10.1016/J.TSF.2007.06.097
A. Badzian, T. Badzian, R. Roy, W. Drawl, Silicon carbonitride, a new hard material and its relation to the confusion about ‘harder than diamond’ C3N4 Thin Solid Films. ,vol. 354, pp. 148- 153 ,(1999) , 10.1016/S0040-6090(99)00535-0
Edward G Gillan, Simon G Bott, Andrew R Barron, None, Volatility studies on gallium chalcogenide cubanes : Thermal analysis and determination of sublimation enthalpies Chemistry of Materials. ,vol. 9, pp. 796- 806 ,(1997) , 10.1021/CM960485J