Measurement of atomic hydrogen flow density during GaAs surface cleaning
作者： V. A. Kagadei , E. V. Nefyodtsev , D. I. Proskurovski , S. V. Romanenko
DOI: 10.1117/12.802357
关键词: Chemical species 、 Gallium arsenide 、 Planar 、 Optoelectronics 、 Optics 、 Microelectronics 、 Resistor 、 Chemistry 、 Hydrogen 、 Thin film 、 Beam (structure)
摘要: The eight-channel thin-film resistive sensor of atomic hydrogen which in the automated mode allows to measure atoms flow density atomic-molecular mix conditions low gas pressure (10 -2 -10 -4 Pa) and under action infra-red visible radiation noises is described. can be used for measurement AH distribution on large cross-section beam, including during GaAs surface cleaning. range 5u10 13 16 at.cm s -1 time 1-10 minutes. resistor produced by microelectronics planar technology that provides an opportunity high space resolution at beam spatial distributions measurement.
harvard.edu
sci-hub.se 参考文章(21)
N HOSODA, Y KYOGOKU, T SUGA, Effect of the surface treatment on the room-temperature bonding of Al to Si and SiO2 Journal of Materials Science. ,vol. 33, pp. 253- 258 ,(1998) , 10.1023/A:1004390923252
Kun-Wei Lin, Huey-Ing Chen, Chun-Tsen Lu, Yan-Ying Tsai, Hung-Ming Chuang, Chun-Yuan Chen, Wen-Chau Liu, A hydrogen sensing Pd/InGaP metal-semiconductor (MS) Schottky diode hydrogen sensor Semiconductor Science and Technology. ,vol. 18, pp. 615- 619 ,(2003) , 10.1088/0268-1242/18/7/303
A. M. Bruneteau, G. Hollos, M. Bacal, J. Bretagne, Temperature and relative density of atomic hydrogen in a multicusp H− volume source Journal of Applied Physics. ,vol. 67, pp. 7254- 7264 ,(1990) , 10.1063/1.344559
A Khatiri, J.M Ripalda, T.J Krzyzewski, G.R Bell, C.F McConville, T.S Jones, Atomic hydrogen cleaning of GaAs(001): a scanning tunnelling microscopy study Surface Science. ,vol. 548, ,(2004) , 10.1016/J.SUSC.2003.11.007
G. Bruno, M. Losurdo, P. Capezzuto, Phosphorus ablation process as a hydrogen atom probe in a remote H2 plasma reactor Applied Physics Letters. ,vol. 66, pp. 3573- 3575 ,(1995) , 10.1063/1.113791
Hermann Nienhaus, Howard S. Bergh, Brian Gergen, Arun Majumdar, W. Henry Weinberg, Eric W. McFarland, Selective H atom sensors using ultrathin Ag/Si Schottky diodes Applied Physics Letters. ,vol. 74, pp. 4046- 4048 ,(1999) , 10.1063/1.123256
V. Kagadei, E. Nefyodtsev, D. Proskurovsky, Sv. Romanenko, N. Shevchenko, D. Grambole, R. Groetzschel, F. Herrmann, Yu. Ivanov, The effect of atomic hydrogen flow on electrical resistance of the transition metal films Sensors and Actuators A-physical. ,vol. 113, pp. 293- 300 ,(2004) , 10.1016/J.SNA.2004.01.011
T. Schwarz-Selinger, A. von Keudell, W. Jacob, Novel method for absolute quantification of the flux and angular distribution of a radical source for atomic hydrogen Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 18, pp. 995- 1001 ,(2000) , 10.1116/1.582289
S. N. Foner, Free Radicals and Unstable Molecules. Science. ,vol. 143, pp. 441- 450 ,(1964) , 10.1126/SCIENCE.143.3605.441
Yu. A. Akulov, B. A. Mamyrin, P. M. Shikhaliev, Production of atomic hydrogen in an rf gas discharge and mass spectrometer diagnostics of the process Technical Physics. ,vol. 42, pp. 584- 585 ,(1997) , 10.1134/1.1258674