Processing of ceramics by excimer lasers

摘要: Processing of S13N4 arid Zr02 ceramics was rerformed by using ArF , KrF and XeF excimer lasers with mainly mask projection, characteristics ceramic processing and surface appearance were analyzed. Focused excimer laser beam from unstable resonator also used for cutting, compared focused c02 YAG of nonnal pulse. Material removal process O2 of normal pulse on the basis energy analysis, X-ray diffraction spectral analysis during ablation Si3N4 . It found that in material processing 002 YAG lasers, is decomposed into N liquid Si, which attaches to surface, producing roughened cracks On other hand, laser processing, Si. (g) accompanying ionized Si its high peak power resulting excellent quality without deposition of decomposed materials The mechanism uneven Zr02 ceramics discussed.