Field deposition from metallic tips onto insulating substrates
作者： S Fostner , A Tekiel , J M Topple , Y Miyahara , P Grütter
DOI: 10.1088/0957-4484/22/46/465301
关键词: Fermi gas 、 Analytical chemistry 、 Cantilever 、 Desorption 、 Electrode 、 Electron beam-induced deposition 、 Deposition (phase transition) 、 Ion 、 Materials science 、 Metal
摘要: The deposition of gold ions from atomic force microscope cantilever tips onto bulk insulating substrates with nearby surface electrodes is discussed. Numerical models the potential distribution are used to estimate barriers for desorption process. These indicate height thresholds 7–10 nm tip 20–25 metallic electrode edge over a KBr but greater than 20 high InP/GaAs/InP two-dimensional electron gas (2DEG) as back electrode. Experimental results clusters surfaces near metal in ultra-high vacuum (UHV) presented and show promising agreement calculations threshold heights. Deposition InP discussed comparison indicates similar trends.
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