Spin deposition of MoSx thin films

摘要: Thin films of MoS 2 and amorphous 3 have been prepared on various glass stainless steel substrates by thermolysis spin cast solutions (NH 4 ) in an organic diamine (ethylenediamine 1,2-diaminopropane). After deposition the resulting single-source precursor film [(H NC n H 2n NH )MoS ] was dried at 250°C air subsequently heat treated temperatures between 300 800°C under inert nitrogen (N atmosphere yielding x (2 ≤ 3) with carbon impurities. The thicknesses up to 160 nm (800°C) 250 (300°C) are highly homogeneous a metallic lustre appear brown transmission. While X-ray diffraction 400°C, crystallinity increases for higher due formation microcrystallites. Furthermore, composition microstructure strongly depend used solvent. Both electron reveal partially preferred orientation crystallites their basal planes parallel substrate ( ⊥ c, type II). treatment N layer stacks consist three four layers length 5-8 nm. optical characterisation thin shows strong absorption visible part spectrum characteristic coefficient α 550 × 10 5 cm 1 . Tribological measurements 5000 cycles against highest wear-life friction μ < 0.1 coatings 500°C. capacity reversible electrochemical Li intercalation 30 mC/cm found (400°C treatment). A weak electrochromic effect change transmission ΔT 0.08 around 800 observed after intercalation.