MOCVD of Molybdenum Sulphide Thin Film via Single Solid Source Precursor Bis-(Morpholinodithioato-s,s')-Mo
作者： Bolutife Olofinjana , Gabriel Egharevba , Bidini Taleatu , Olumide Akinwunmi , Ezekiel Oladele Ajayi
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摘要: A single solid source precursor bis-(morpholinodithioato-s,s’)-Mo was prepared and molybdenum sulphide thin film deposited on sodalime glass using Metal Organic Chemical Vapour Deposition (MOCVD) technique at deposition temperature of 420?C. The characterized Rutherford Backscattering Spectroscopy (RBS), Ultraviolet-Visible Spectroscopy, Four point probe technique, Scanning Electron Mi-croscopy (SEM), X-ray Diffractometry (XRD) Atomic Force Microscopy (AFM). direct optical band gap 1.77 eV obtained from the analysis absorption spectrum. sheet resistance found to be order 10P–5P ΩP–1P?cmP–1P. SEM micrographs films showed layered structure with an estimated grain size that is less than 2 µm while XRD indicates parallel orientation basal plane substrate surface.
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