Structure and optical properties of molybdenum disulphide (MoS2) thin film deposited by the dip technique

作者: S. C. Ray

DOI: 10.1023/A:1006737326527

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摘要: Molybdenum dichalcogenides appear to be very promising semiconductor materials for various applications such as solar cells [1, 2], rechargeable batteries [3] and solid lubricants metallic ceramic surfaces in environments where hydrocarbon or other fluid-based are unsuitable, high vacuum temperature [4, 5]. They have also been widely used space-technology their low co-efficient of friction is particular value [6]. These arise from the optical, electrochemical mechanical properties these compounds. exhibit a layer-type structure which monolayers Mo sandwiched between sulphur, held together by relatively weak van der Waals forces. band gaps (1.78 eV) well-matched spectrum [7]. A number methods exist production MoS2 thin films, including sputtering [8–10], deposition [7, 11], pulsed laser [12–15]. In this communication, preliminary results on structural optical films produced dip-coating [16, 17] technique reported. film process substrate was first immersed then withdrawn vertically freshly prepared methanolic solution ammonium molybdate thiocyanate at controlled speed about 1.33 mm/s with help pulley geared motor. The liquid layer adhering it transferred furnace under atmospheric conditions heat treatment. chemicals reacted form desired according following reaction.

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