Nanoscale triboactivity of functionalized c-Si surfaces by Fe⁺ ion implantation.

摘要: In the present work, we a study of effect Fe(+) ion implantation on tribological response at nanoscale contact lengths crystalline silicon (c-Si) surfaces. (1 0 0) wafers were implanted with fluence 2  ×  10(17) cm(-2), followed by annealing treatments temperatures 800 °C and 1000 °C. After microstructural characterization, nanoabrasive wear tests performed an atomic force microscope (AFM) using AFM diamond tip stiff steel cantilever that enables application loads between 1 μN 8 μN. nanowear tests, same was used to visualize measure worn craters. It observed as-implanted samples poorest response, i.e. highest rate, even higher than unimplanted Si as reference. Nevertheless, result in measurable increase resistance. this way show c-Si, proper post-heat treatment, results formation FeSi2 nanoprecipitates finely dispersed recrystallized matrix. This can be valuable optimizing nanotribological behavior silicon.