作者: Giwoong Nam , Byunggu Kim , Jae-Young Leem
DOI: 10.1016/J.JALLCOM.2015.08.088
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摘要: Abstract The sol–gel spin-coating method is usually used for thin-film deposition rather than to grow one-dimensional nanostructures. In this study, a novel regrowth spin-coated ZnO:In3+ films demonstrated, using vapor-confined face-to-face annealing (VC-FTFA) in which mica sheet inserted between the two prior FTFA. nanorods are regrown when indium chloride as solvent because ZnCl2 and InCl3 vapors generated confined films. near-band-edge emission intensity of resulting from VC-FTFA at 700 °C enhanced by factor 17 compared with that annealed open air same temperature. Our offers simple low-cost route fabrication ZnO nanorods.