A sub-micron particle filter in silicon

摘要: Abstract A multi-purpose screen filter structure in silicon has been fabricated and characterized. The fabrication of the is based on a two-step self-aligning process using lateral boron doping, anisotropic etching dioxide undercut etching. Filters for filtration particles down to 50 nm have fabricated. flow resistance gases liquids measured. fluid passes between two electrically conducting membranes, so other applications such as identification concentration measurements are possible. preliminary experiment presented.