Electron-silane scattering cross section for plasma assisted processes

作者: Pankaj Verma , Jaspreet Kaur , Bobby Antony

DOI: 10.1063/1.4976833

关键词:

摘要: Silane is an important molecule with numerous applications to natural and technological plasmas. In such environments, where plasma assisted processes are vital, electron induced reactions play a major role in its chemistry. view of this, scattering molecules as silane finds significance. This article reports comprehensive study impact cross sections for over wide energy range. particular, the emphasis given providing complete dataset various events possible silane. Such need modeling community. Moreover, literature survey shows that section database fragmentary. To fill this void, we have computed differential elastic, total, rotational excitation, momentum transfer sections. Two formalisms reliable their domain employed accomplish task: R-matrix method through QUANTEMOL-N at low incident energies spherical...

参考文章(54)
Antonio Zecca, Grzegorz P. Karwasz, Roberto S. Brusa, Total-cross-section measurements for electron scattering by NH3, SiH4, and H2S in the intermediate-energy range. Physical Review A. ,vol. 45, pp. 2777- 2783 ,(1992) , 10.1103/PHYSREVA.45.2777
Márcio T. N. Varella, Márcio H. F. Bettega, Marco A. P. Lima, Cross sections for rotational excitations of CH 4 , SiH 4 , GeH 4 , SnH 4 and PbH 4 by electron impact European Physical Journal D. ,vol. 39, pp. 59- 67 ,(1997) , 10.1007/S004600050110
Kenneth J. Mathieson, Paul G. Millican, Isobel C. Walker, Martin G. Curtis, Low-energy-electron collision cross-sections in silane Journal of the Chemical Society, Faraday Transactions 2. ,vol. 83, pp. 1041- 1048 ,(1987) , 10.1039/F29878301041
Carl Winstead, Howard P. Pritchard, Vincent McKoy, Electronic excitation of silane (SiH4) by low‐energy electron impact Journal of Chemical Physics. ,vol. 101, pp. 338- 342 ,(1994) , 10.1063/1.468492
Mark S. Gordon, Excited States and Photochemistry of Saturated Molecules. IX. Vertical Excited States of Silane Journal of Chemical Physics. ,vol. 69, pp. 4955- 4961 ,(1978) , 10.1063/1.436484
Jonathan Tennyson, Electron–molecule collision calculations using the R-matrix method Physics Reports. ,vol. 491, pp. 29- 76 ,(2010) , 10.1016/J.PHYSREP.2010.02.001
Toshiaki Makabe, Tetsuya Tatsumi, Workshop on atomic and molecular collision data for plasma modelling: database needs for semiconductor plasma processing Plasma Sources Science and Technology. ,vol. 20, pp. 024014- ,(2011) , 10.1088/0963-0252/20/2/024014
Lek Chantranupong, Gerhard Hirsch, Robert J. Buenker, Michael A. Dillon, Configuration interaction calculations of the vertical electronic spectrum of silane principles and practice of constraint programming. ,vol. 170, pp. 167- 175 ,(1993) , 10.1016/0301-0104(93)80061-D