Chemical bonds and elemental compositions of BCxNylayers produced by chemical vapor deposition with trimethylamine borane, triethylamine borane, or trimethylborazine
作者： Peter S. Hoffmann , Olaf Baake , Marina L. Kosinova , Burkhard Beckhoff , Andreas Klein
DOI: 10.1002/XRS.2387
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摘要: BCxNy films were produced from single-source precursors in a chemical vapor deposition process. The boranes introduced as at low pressure conditions and temperature of 700 °C, whereas the borazine was handled 400 °C with plasma enhancement an electrical power input 40 W. Additionally, inert or reactive gases, H2, He, N2, NH3, respectively, used. deposited on Si(100) substrates chemically characterized by X-ray photoelectron spectroscopy synchrotron radiation-based total-reflection fluorescence combined near-edge absorption fine structure quantified elementally energy-dispersive spectroscopy. results are critically compared. With application without compounds dominating carbidic character identified, addition NH3 to boranes, nitridic prevalent. In case using for synthesis, found all auxiliary gases. For both groups stoichiometric formulas derived proposed: B3.5–4C4N2–2.5 region B3.5C1.5N5 region. Copyright © 2012 John Wiley & Sons, Ltd.
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