Speciation of BCxNy films grown by PECVD with trimethylborazine precursor

摘要: Films of BCxNy were produced in a plasma-enhanced chemical vapor deposition process using trimethylborazine as precursor and with H2, He, N2, NH3, respectively, auxiliary gas. These films deposited on Si(100) wafers or fused quartz glass substrates characterized chemically by X-ray photoelectron spectroscopy synchrotron radiation-based total-reflection fluorescence combined near-edge absorption fine structure. Independent the gas, B–N bonds are dominating. Furthermore, B–C N–C identified. Oxygen, present bulk (in contrast to surface layer some nanometers, where molecular oxygen and/or water absorbed) an impurity, is bonded boron carbon, respectively. The relation nitrogen changes character gas: cB/cN ≈ 4:3 (for H2 He) 1 N2 NH3). physical properties such refractive index optical band-gap energy determined.