Optical and electrical characteristics of plasma enhanced chemical vapor deposition boron carbonitride thin films derived from N-trimethylborazine precursor

摘要: Abstract Thin BCxNy films have been obtained by plasma enhanced chemical vapor deposition using N-trimethylborazine as a precursor. The were deposited on Si(100) and fused silica substrates. grown characterized ellipsometry, Fourier transform infrared spectroscopy, scanning electron microscopy, X-ray energy dispersive photoelectron spectrophotometry, capacitance–voltage current–voltage measurements. parameters, such substrate temperature (373–973 K) gas phase composition varied. Low found to be high optical transparent layers in the range of 300–2000 nm, transmittance 93% has achieved. are dielectrics with dielectric constant k = 2.2–8.9 depending synthesis conditions.