Fixtures for processing a workpiece in a supercritical fluid

作者: John Michael Cotte , John P. Simons , Charles J. Taft , Matteo Flotta , Wayne Martin Moreau

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摘要: Fixtures and methods for clamping workpieces in a workplace to enable the optimized exposure thereof stream or flow of supercritical fluid. Provided is rotatably indexable chuck locator mounting workpiece enabling orientating latter specific static pitch position within high pressure vessel order subject full frontal fluid vessel. This arrangement facilitates an optimum positioning being processed path while oriented selectively indexed rotational positions.

参考文章(1)
Kohsaku Yano, Tetsuya Ueda, Apparatus for dry etching ,(1990)