Synthesis of succinylated poly(4‐hydroxystyrene) and its application for negative‐tone photoresist
作者： Hyejin Cho , Junyoung Kim , Prashant Patil , Jun Young Kim , Tae-Ho Kim
DOI: 10.1002/APP.24979
关键词:
摘要: Atom transfer radical polymerization (ATRP) was used to prepare poly(acetoxystyrene) (PAS) with a controlled molecular weight and narrow polydispersity. Using 1-phenylethylbromide (PEBr)/CuBr/Cu(0)/2,2′-bipyridine as an initiating system, the heterogeneous ATRP of 4-acetoxystyrene carried out form PAS precursor polymer. The reaction follows first-order kinetics respect conversion monomer. A linear (polydispersities Mw/Mn = 1.07–1.27) indicates “living”/controlled nature polymerization. obtained chemically modified obtain succinylated poly(hydroxystyrene) (Succ-PHS). formulation Succ-PHS, crosslinker (benzoguanamine-formaldehyde), triphenylsulfonium triflate (TPST) photo acid generator (PAG) by UV irradiation using i-line tool. performance resultant polymer negative resist pattern photoresist for photolithography studied instrumental techniques. © 2006 Wiley Periodicals, Inc. J Appl Polym Sci 103: 3560–3566, 2007
sci-hub.se 参考文章(26)
Toshio Ito, Ueno Takumi, Saburo Nonogaki, Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology ,(1998)
Nariyoshi Kawabata, Yukihiko Taketani, Removal and Recovery of Organic Pollutants from Aquatic Environment. V. Crosslinked Poly(hydroxystyrene) as a Polymeric Adsorbent for Removal and Recovery of ε-Caprolactam from Aqueous Solution Bulletin of the Chemical Society of Japan. ,vol. 53, pp. 2986- 2989 ,(1980) , 10.1246/BCSJ.53.2986
Craig J. Hawker, Molecular Weight Control by a "Living" Free-Radical Polymerization Process Journal of the American Chemical Society. ,vol. 116, pp. 11185- 11186 ,(1994) , 10.1021/JA00103A055
Roderick R. Kunz, Susan C. Palmateer, Anthony R. Forte, Robert D. Allen, Gregory M. Wallraff, Richard A. Di Pietro, Donald C. Hofer, Limits to etch resistance for 193-nm single-layer resists Proceedings of SPIE, the International Society for Optical Engineering. ,vol. 2724, pp. 365- 376 ,(1996) , 10.1117/12.241835
M. Aguiar, B. Hu, F. E. Karasz, L. Akcelrud, Light-Emitting Polymers with Pendant Chromophoric Groups. 2. Poly[styrene-co-(p-(stilbenylmethoxy)styrene)] Macromolecules. ,vol. 29, pp. 3161- 3166 ,(1996) , 10.1021/MA951561R
J. Mohammed Nasrullah, S. Raja, K. Vijayakumaran, R. Dhamodharan, A practical route for the preparation of poly(4-hydroxystyrene), a useful photoresist material Journal of Polymer Science Part A. ,vol. 38, pp. 453- 461 ,(2000) , 10.1002/(SICI)1099-0518(20000201)38:3<453::AID-POLA9>3.0.CO;2-6
Herv� Deleuze, David C. Sherrington, Poly(p-acetoxystyrene) resin: a prospective new support for combinatorial synthesis Journal of The Chemical Society-perkin Transactions 1. pp. 2217- 2221 ,(1995) , 10.1039/P29950002217
M. Save, J. V. M. Weaver, S. P. Armes, P. McKenna, Atom Transfer Radical Polymerization of Hydroxy-Functional Methacrylates at Ambient Temperature: Comparison of Glycerol Monomethacrylate with 2-Hydroxypropyl Methacrylate Macromolecules. ,vol. 35, pp. 1152- 1159 ,(2002) , 10.1021/MA011541R
U. Westerwelle, G. Bähr, G. Grützner, F. Reuther, Partially carboxymethylated novolaks for photoresist systems: new photoresists for development under mildly alkaline conditions Microelectronic Engineering. ,vol. 41, pp. 343- 346 ,(1998) , 10.1016/S0167-9317(98)00079-3
Jian Qiu, Krzysztof Matyjaszewski, Polymerization of Substituted Styrenes by Atom Transfer Radical Polymerization Macromolecules. ,vol. 30, pp. 5643- 5648 ,(1997) , 10.1021/MA9704222