Cleaning process and apparatus for silicate materials

摘要: A method for treating a surface of quartz substrate includes preparing to provide working having an initial roughness; and then ultrasonically acid-etching the increase roughness by at least about 10%. In one embodiment, is greater than 10 Ra, in another embodiment 200 Ra. still further area, if less increased other embodiments present invention, 25% or 50%. Simultaneous with area (as measured roughness), defects are reduced reduce particulate contamination from substrate.