作者: S. Warren , A. Reitzle , A. Kazimirov , J.C. Ziegler , O. Bunk
DOI: 10.1016/S0039-6028(01)01589-8
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摘要: Abstract Electroless deposition of gold in monolayer amounts on hydrogen terminated Si(1 1 1) was studied by a variety structure sensitive techniques. Rutherford back scattering data revealed linear relationship between the Au coverage and concentration solution used for deposition. Atomic force microscopy surface X-ray diffraction studies indicated cluster formation, with Au(1 1 1) face epitaxially aligned to Si(1 1 1):H substrate. However, standing wave experiments at below one suggested formation layer. Both clusters isolated atoms appear be present all coverages, which is explained type `wetting layer', addition increases as increases.