Simulation of a mirror corrector for PEEM3
作者： W. Wan , J. Feng , H.A. Padmore , D.S. Robin
DOI: 10.1016/J.NIMA.2003.11.159
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摘要: Abstract A third generation aberration-corrected Photoemission Electron Microscope is being designed at the Advanced Light Source. An electron mirror used for correction of lowest order spherical and chromatic aberrations. Two very different methods, one using finite-element method ray-tracing technique other charge ring differential algebra technique, have been employed to simulate electrostatic field behavior beam. Good agreement has obtained between two methods a tetrode found effectively correct Operating 20 kV , point resolution 100% transmission reaches 50 nm with corrector, significant reduction from that 440 without correction. The highest achieved 4 2% transmission, as opposed 1%
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