Structural and optical properties of GaN-based nanocrystalline thin films

作者: C.E.A. Grigorescu , L. Tortet , O. Monnereau , L. Argeme , H.J. Trodahl

DOI: 10.1016/J.TSF.2007.07.201

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摘要: Abstract We study the effect of annealing on structure, morphology and optical properties nanocrystalline films GaN, GaN:O GaN:Mn prepared by ion assisted deposition silicon, quartz glassy carbon substrates. Blisters holes having diameters proportional with thickness film were observed in deposited silicon carbon. The Mn excess turns through into x N y islands. degree short- intermediate-range order was investigated micro-Raman spectroscopy, extending to about 3 nm for gallium oxynitride annealed 973 K more than 10 nm GaN samples. A diminished oxygen content following procedures samples is noticed from reduced intensity mode at 1000 cm − 1 Raman spectra. This observation supported X-ray photoemission spectroscopy measurements. presence concentrations above 15at.% leads an abrupt nanocrystalline–amorphous transition.

参考文章(14)
Hong Chen, Kuiying Chen, D. A. Drabold, M. E. Kordesch, Band gap engineering in amorphous AlxGa1−xN: Experiment and ab initio calculations Applied Physics Letters. ,vol. 77, pp. 1117- 1119 ,(2000) , 10.1063/1.1289496
B. J. Ruck, A. Koo, U. D. Lanke, F. Budde, S. Granville, H. J. Trodahl, A. Bittar, J. B. Metson, V. J. Kennedy, A. Markwitz, Quantitative study of molecular N 2 trapped in disordered GaN:O films Physical Review B. ,vol. 70, pp. 235202- ,(2004) , 10.1103/PHYSREVB.70.235202
K. Yamada, H. Asahi, H. Tampo, Y. Imanishi, K. Ohnishi, K. Asami, Strong photoluminescence emission from polycrystalline GaN layers grown on W, Mo, Ta, and Nb metal substrates Applied Physics Letters. ,vol. 78, pp. 2849- 2851 ,(2001) , 10.1063/1.1371528
A. Bittar, H. J. Trodahl, N. T. Kemp, A. Markwitz, Ion-assisted deposition of amorphous GaN: Raman and optical properties Applied Physics Letters. ,vol. 78, pp. 619- 621 ,(2001) , 10.1063/1.1345800
Yixiu Kang, David C. Ingram, Properties of amorphous GaNx prepared by ion beam assisted deposition at room temperature Journal of Applied Physics. ,vol. 93, pp. 3954- 3962 ,(2003) , 10.1063/1.1555258
F. Budde, B. J. Ruck, S. Rubanov, J. B. Metson, A. Bittar, Bernard Bonnet, M. J. Ariza, D. J. Jones, G. V. M. Williams, S. Granville, P. Munroe, H. J. Trodahl, Annette Koo, Stabilization of amorphous GaN by oxygen Journal of Applied Physics. ,vol. 98, pp. 063514- ,(2005) , 10.1063/1.2014937
P. Stumm, D. A. Drabold, CAN AMORPHOUS GAN SERVE AS A USEFUL ELECTRONIC MATERIAL Physical Review Letters. ,vol. 79, pp. 677- 680 ,(1997) , 10.1103/PHYSREVLETT.79.677
M. Katsikini, K. Papagelis, E. C. Paloura, S. Ves, Raman study of Mg, Si, O, and N implanted GaN Journal of Applied Physics. ,vol. 94, pp. 4389- 4394 ,(2003) , 10.1063/1.1606521
H.J. Trodahl, C.E.A. Grigorescu, A. Bittar, F. Budde, B.J. Ruck, S. Granville, G.V.M. Williams, O. Monnereau, R. Notonier, SEM and Raman studies of annealed nanocrystalline GaN and amorphous GaN:O Journal of Non-crystalline Solids. ,vol. 352, pp. 1282- 1285 ,(2006) , 10.1016/J.JNONCRYSOL.2005.11.106
Martin Kuball, Hossein Mokhtari, David Cherns, Jun Lu, David I. Westwood, Amorphous GaN Grown by Room Temperature Molecular Beam Epitaxy Japanese Journal of Applied Physics. ,vol. 39, pp. 4753- 4754 ,(2000) , 10.1143/JJAP.39.4753