Method for continuously forming functional deposited films with a large area by a microwave plasma cvd method

摘要: A method for continuously forming a functional deposited film with large area according to microwave plasma CVD process is described. The comprises the steps of traveling band-shaped member containing conductive along its length during which pillar-shaped film-forming space capable being kept substantially in vacuum therein established by use as side wall space, charging starting gases formation through gas feed means into and simultaneously radiating antenna all directions vertical direction movement so that power supplied initiate whereby on surface constitutes exposed plasma. An apparatus carrying out also