Evaluation of CF4 plasma chemistry by power modulation

作者: L. D. B. Kiss , H. H. Sawin

DOI: 10.1007/BF01447257

关键词:

摘要: The dominant chemical reaction kinetics occurring in the plasma environment are studied by small periodic power modulation and analyzed using transfer functions. A CF4/Ar rf at 500 mTorr was chosen to validate this experimental methodology because of CF, system have been well previously.(1) results demonstrated that technique can determine reactions plasma. also confirmed importance surface recombination provided quantitative total sticking coefficients for F, CF2 CF: γF=0.02, γCF2=0.05, γCF≥0.20. indicated an activated intermediate may be a precursor formation both CF from CF4. Energetic considerations excited-.state lifetime calculations suggest internally excited CF3* radical.

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