Formation of OVD Using Laser Interference Lithography

摘要: In the present research we have fabricated and investigated optically variable devices (OVDs) (a system of submicron period surface relief diffraction gratings). For this purpose recorded interference pattern two HeCd laser beams through a set masks, forming contours image, in photoresist (holographic technique). Changing angles between interfering achieved 0.7, 0.8, 0.9 1.2 μm gratings. The microrelief gratings from resist was transferred to metallic stamp using vacuum deposition (of Ag, Ni, Cu) electrochemical nickel deposition. Diffraction efficiency measured experimentally linear dimensions were defined by scanning electron microscopy (SEM) atomic force (AFM). main experimental results compared with computer simulations where standard software (“PCGrate”) employed calculate different depth for wavelengths visible light. Influence sublayers used during on parameters (period, shape) structures defined.