Interlayer insulating thin film
作者： 花畑 博之 , 王 正宝 , Masayoshi O , Hiroyuki Hanabatake
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摘要: PROBLEM TO BE SOLVED: To provide an interlayer insulating porous silica zeolite thin film which has stable low dielectric constant, high breakdown voltage, and mechanical strength. SOLUTION: In manufacturing application composition, a molar ratio of molecule obtained by making tetrafunctional alkoxysilane expressed in Si(OR 2 ) 4 perform polycondensation reaction under presence organic amine precursor setting having at least one univalent group as main raw material is controlled specific range; impurities volume metal composition containing solvent also range. the film, crystallinity range, content to Si element COPYRIGHT: (C)2008,JPO&INPIT
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