Method of forming amorphous silica coating of low dielectric constant and amorphous silica coating of low dielectric constant obtained thereby
作者： Miki Egami , Akira Nakashima , Michio Komatsu
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摘要: A method of stably forming an amorphous silica coating low dielectric constant with a specific inductive capacity as 3.0 or below, the having strength GPa higher Young's modulus, on substrate. The comprises steps (a) applying onto substrate liquid composition containing hydrolyzate organosilicon compound obtained by hydrolysis in presence tetraalkylammonium hydroxide (TAAOH); (b) placing resultant apparatus and drying provided under 25° to 340°C temperature conditions; (c) introducing superheated steam performing heat treatment 105° 450°C (d) nitrogen gas firing 350° conditions.
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