作者: C. A. Decker , R. Solanki , J. L. Freeouf , J. R. Carruthers , D. R. Evans
DOI: 10.1063/1.1650877
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摘要: … We report here our initial results of growth of Ni silicide … A contiguous growth of Ni silicide and silicon NWs would reduce … Ni films can be increased with a rapid thermal anneal RTA …