Internal balanced coil for inductively coupled high density plasma processing chamber
作者： Robert Chen , Muhammad Rasheed , Qiwei Liang , Zhong Qiang Hua , Xinglong Chen
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摘要: A coil is provided for use in a semiconductor processing system to generate plasma with magnetic field chamber. The comprises first segment, second segment and an internal balance capacitor. coils has end end. of the adapted connect power source. external capacitor connected series between segment. segments are provide voltage peak along substantially aligned virtual ground
lens.org 参考文章(15)
Joung Kim, Gi Kwon, Hong Kim, Bu Ko, Sung Lee, Hong Byun, Sun Han, Plasma processing apparatus having parallel resonance antenna for very high frequency ,(2002)
Craig A. Roderick, Plasma system with a balanced source ,(1996)
David P. Sun, Maolin Long, Side RF coil and side heater for plasma processing apparatus ,(2005)
Neal Rueger, Ross Dando, Gurtej Sandhu, Allen Mardian, Kevin Hamer, Weimin Li, Li Li, Gas delivery system for deposition processes, and methods of using same ,(2002)
Donald E. Thompson, Electrostatic filter for dielectric fluid ,(1999)
David W. Groechel, Craig A. Roderick, D. Pinson Ii Jay, John R. Trow, Kenneth S. Collins, Peter R. Keswick, Masato M. Toshima, Chan-Lon Yang, Jeffrey Marks, Gerald Z. Yin, Jerry Y. Wong, Tetsuya Ishikawa, Lawrence C. Lei, Silicon scavenger in an inductively coupled RF plasma reactor ,(1993)
Brian McMillin, Frank Yun Lin, Arthur M. Howald, Plasma excitation coil ,(2002)
Reinhard Fendler, François Rossi, Pascal Colpo, Inductively coupled plasma processing apparatus ,(2005)
Paul E. Luscher, Michael Welch, Siamak Salimian, Peter Loewenhardt, Rolf Guenther, Zhong Qiang Hua, Son Phi, Temperature controlled dome-coil system for high power inductively coupled plasma systems ,(2002)
Akio Ui, Hideshi Miyajima, Naruhiko Kaji, Nobuo Hayasaka, CVD apparatus with high throughput and cleaning method therefor ,(1997)