Process for isolating semiconductor elements
作者： William J Greig
DOI:
关键词:
摘要: In the manufacture of beam lead integrated circuits or discrete devices, each operating semiconductor portion one conductivity type is surrounded by substrate material opposite type. The removed a preferential electrolytic etching process to provide isolation between semiconductor-operating portions.
lens.org 参考文章(3)
Gordon J Lasher, Multistable device operating on the principle of stimulated emission of radiation ,(1964)
John C Marinace, Method of electrolytically etching a semiconductor having a single impurity gradient ,(1965)
Richard A Williams, John W Tiley, Semiconductive devices and methods for the fabrication thereof ,(1954)