Optical heat source with restricted wavelengths for process heating
作者： William DiVergilio , Marvin Farley , W. Davis Lee , David Bernhardt
DOI:
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摘要: A semiconductor manufacturing system or process, such as an ion implantation system, apparatus and method, including a component step for heating workpiece are provided. An optical heat source emits light energy to the workpiece. The is configured provide minimal reduced emission of non-visible wavelengths emit at wavelength in maximum absorption range
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