Photoresists which are suitable for producing sub-micron size structures
作者： Horst Borndoerfer , Siegfried Birkle , Hellmut Ahne , Rainer Leuschner , Michael Sebald
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摘要: A photoresist suitable for the production of structures in submicron range contains following components: a polymer component with carboxylic acid anhydride functions and tert. butyl ester groups photoinitiator which releases an when exposed solvent.
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