作者: Mario Tului , Alessandra Bellucci , Stefania Bellini , Augusto Albolino , Giuseppe Migliozzi
DOI: 10.1016/J.TSF.2012.02.002
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摘要: Abstract Indium tin oxide coatings were deposited by magnetron sputtering physical vapour deposition under different atmospheres. Microstructural, electrical, and optical properties measured, finding a correlation among process parameters. Texture analyses carried out X-ray diffraction showed that films microstructure depended the oxygen content in vessel: high values of (e.g., 5%) caused film to grow along orientation; pure Ar, grains grew orientation. Intermediate growth two families grains, respectively oriented directions.