Fabrication and characterization of indium tin oxide films
作者： Shiuh-Chuan Her , Chun-Fu Chang
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摘要: BACKGROUND Transparent conducting oxide (TCO) films are of particular interest in the field optoelectronics, due to requirement for transparent electrodes applications such as organic light-emitting diodes, solar cells and so on. The aim this study was obtain a better understanding effects preparation temperature on indium tin (ITO) films, improve their performance optoelectronic applications. METHODS ITO were deposited glass substrate at different temperatures, using direct current (DC) magnetron sputtering. influence microstructure electrical optical properties studied. surface topography analyzed by atomic force microscopy. resistivity transmittance measured Hall effect measurement spectrometer, respectively. RESULTS results showed that both roughness film thickness increased increased. Transmittance from 78% 80% visible wavelength region, while decreased 6.05 × 10-4 3.27 Ω-cm 25°C 275°C. CONCLUSIONS High-quality with low high can be achieved increasing deposition temperature.
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